U.S. federal trademark · Serial No. 77371192 · Reg. No. 3617009
Chemicals and chemical slurries for polishing semiconductors; abrasive polishing slurries and non-abrasive chemical polishing slurries used for polishing semiconductors, to planarize, smooth, or otherwise modify their surfaces, for use in the semiconductor, electronic and electronic devices, wafer and storage media, and polishing pad industries
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.