Trademark Search  /  AIR LIQUIDE ADVANCED MATERIALS

AIR LIQUIDE ADVANCED MATERIALS

● Live · Registered

U.S. federal trademark · Serial No. 79171167 · Reg. No. 5461134

Mark
AIR LIQUIDE ADVANCED MATERIALS
Status
Registered
Serial Number
79171167
Registration No.
5461134
Filing Date
January 6, 2015
Registration Date
May 8, 2018
Class(es)
Class 001

Owners

L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
99 · PARIS, FR
L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
99 · FR
L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
99 · FR

Goods & Services

Chemicals, gases and gas mixtures, in liquid or gaseous form for use in industry, particularly in the electronics, optoelectronics, fiberoptic and chemical industries, namely, electronics specialty materials, namely, silane, sal ammoniac, nitrous oxide for industrial use; chemicals, gases and gas mixtures in liquid or gaseous form, for the manufacture of high-tech products, particularly semi-conductors, solar cells, light-emitting diodes, flat panel displays and batteries, namely, silicon in the nature of silane, disilane, bis(diethylamino)silane, hexachlorodisilane, trisilylamine, silicon tetrafluoride, boron in the nature of diborane and trimethylboron and transition metal and metalloid containing organic and inorganic compounds, namely, alkylamino, carbonyl, cyclopentadienyl and halides thereof for deposition or removal of transition metal or metalloid-containing thin films, boron-containing compounds, namely, diborane, trimethylboron; chemicals, gases and gas mixtures, in liquid or gaseous form, for use in science, research and material processing, namely, silicon in the nature of silane, disilane, bis(diethylamino)silane, hexachlorodisilane, trisilylamine, silicon tetraflouride, boron in the nature of diborane and trimethylboron, and transition-metal and metalloid containing organic or inorganic compounds, namely, alkylamino, carbonyl, cyclopentadienyl and halides thereof for deposition or removal of transition metal or metalloid-containing thin films

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Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.