U.S. federal trademark · Serial No. 79252181
Apparatus and instruments for thin film processing, namely, atomic layer deposition tools for plasma atomic layer deposition, thermal atomic layer deposition, atomic layer epitaxy, etch tools for atomic layer etching and cluster tools for etching; apparatus and instruments for thin film processing, namely, atomic layer deposition tools for plasma atomic layer deposition, thermal atomic layer deposition, atomic layer epitaxy, etch tools for atomic layer etching and cluster tools for etching with automated handling
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.