U.S. federal trademark · Serial No. 79278016 · Reg. No. 6235878
Thermal treatment furnaces for the thermal treatment of wafers in vacuum or at atmospheric pressure; thermal treatment furnaces for the thermal treatment of surfaces and parts, namely, deposition furnaces, thermal treatment and deposition furnaces for thermal treatment and manufacturing processes
Machines for processing wafers; surface treatment machines, especially for wafers, by diffusion at low pressure or vapor deposition chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD) and low pressure chemical vapor deposition (LPCVD) or at atmospheric pressure or plasma enhanced; machines and machinery apparatus containing horizontal furnaces for thermal treatment, chemical vapor deposition and manufacturing processes
Repair, installation and maintenance related to machines and machine tools and their single parts, related to the production and processing of wafers; Installation services related to components for plant and process optimization for deposition and thermal treatment furnaces, both atmospheric, subatmospheric and vacuum
Computer hardware and recorded software for operating wafer processing machinery and furnaces
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.