Semiconductor wafer processing equipment, and components, namely - exitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

'chemic':10,23 'compon':6 'deposit':12,16 'disc':37 'equip':4 'etcher':19 'exitaxi':8 'film':35 'implant':21 'ion':20 'mechan':24 'name':7 'physic':14 'plasma':18 'polish':25 'process':3,28 'product':30 'reactor':9,13,17 'semiconductor':1,32 'silicon':36 'substrat':33 'thin':34 'vapor':11,15 'wafer':2,39

C-MAX

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