Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, namely, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris

'chemic':1,19,27,37,42 'circuit':18 'clean':41 'cmp':40 'debri':49 'decompos':26 'dielectr':9,33 'film':11,35 'form':29 'insul':10,34 'integr':17 'low':8,32 'manufactur':6 'mechan':38 'name':25 'natur':22 'planar':39 'polish':48 'pore':30 'porogen':24 'post':36 'prepar':43 'remov':45 'semiconductor':15 'slurri':46 'use':3,13

C P-LOK

Owners

Goods & Services