Metrology system consisting of an automated wafer handling system consisting of an XY theta stage and vertical axis drive for positioning the wafer, an optical imaging microscope and an image processing and control computer for the measurement of registration and overlay errors on semiconductor waters and similar substrates

'autom':6 'axi':18 'comput':34 'consist':3,10 'control':33 'drive':19 'error':42 'handl':8 'imag':26,30 'measur':37 'metrolog':1 'microscop':27 'optic':25 'overlay':41 'posit':21 'process':31 'registr':39 'semiconductor':44 'similar':47 'stage':15 'substrat':48 'system':2,9 'theta':14 'vertic':17 'wafer':7,23 'water':45 'xy':13

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