Recorded software to control and modify polishing pad surface temperature while removing films and materials from wafers during semiconductor manufacture

'control':4 'film':13 'manufactur':20 'materi':15 'modifi':6 'pad':8 'polish':7 'record':1 'remov':12 'semiconductor':19 'softwar':2 'surfac':9 'temperatur':10 'wafer':17

Semiconductor wafer processing equipment, namely, hardware to control and modify polishing pad surface temperature while removing films and materials from wafers during semiconductor manufacture

'control':8 'equip':4 'film':17 'hardwar':6 'manufactur':24 'materi':19 'modifi':10 'name':5 'pad':12 'polish':11 'process':3 'remov':16 'semiconductor':1,23 'surfac':13 'temperatur':14 'wafer':2,21

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