U.S. federal trademark · Serial No. 79055146 · Reg. No. 3867511
Electric and electronic measuring, controlling, checking and regulating apparatus, included in this class, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition; semi-conductors; apparatus for recording, transmission or reproduction of sound, images and data; apparatus for the determination of process parameters in plasma processes, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition
Scientific and technological consultation services and research and design relating thereto in the filed of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; industrial analysis and research services in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications
Education services, namely, providing seminars, training, and courses in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; providing of seminars, training and courses in the field of semiconductor processing and manufacturing, radio frequency technology for plasma applications, wafer damaging, e-chuck, arcing, plasma nitridation of ultra SiO2 films, and conditioning and loading effects in plasma etching; publication of texts, other than publicity texts, including internet publication of texts
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.