semiconductor wafer processing equipment and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanter, supporting frames therefor, chemical mechanical polishers, semiconductor wafer process diagnostic and control equipment, photoresist coating and developing equipment and parts thereof

'chemic':10,25 'coat':36 'compon':6 'control':33 'deposit':12,16 'develop':38 'diagnost':31 'epitaxi':8 'equip':4,34,39 'etcher':19 'frame':23 'implant':21 'ion':20 'mechan':26 'name':7 'part':41 'photoresist':35 'physic':14 'plasma':18 'polish':27 'process':3,30 'reactor':9,13,17 'semiconductor':1,28 'support':22 'therefor':24 'thereof':42 'vapor':11,15 'wafer':2,29

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