repair and maintenance of semiconductor wafer processing equipment and components

'compon':10 'equip':8 'mainten':3 'process':7 'repair':1 'semiconductor':5 'wafer':6

semiconductor wafer processing equipment and components, namely epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanter, supporting frames therefor; chemical mechanical polishers, and parts thereof; and computer programs for use therewith

'chemic':10,25 'compon':6 'comput':32 'deposit':12,16 'epitaxi':8 'equip':4 'etcher':19 'frame':23 'implant':21 'ion':20 'mechan':26 'name':7 'part':29 'physic':14 'plasma':18 'polish':27 'process':3 'program':33 'reactor':9,13,17 'semiconductor':1 'support':22 'therefor':24 'thereof':30 'therewith':36 'use':35 'vapor':11,15 'wafer':2

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