Radio-frequency (RF) power supplies and RF plasma generators for semiconductor manufacturing; electrical power control apparatus for conducting, regulating, and controlling RF power delivered to plasma sources; RF power systems for inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) generation; equipment for supplying RF power for wafer biasing in semiconductor processing; electronic apparatus for monitoring, modulating, and controlling plasma processes in semiconductor fabrication chambers.

'apparatus':17,55 'bias':50 'capacit':38 'ccp':41 'chamber':66 'conduct':19 'control':16,22,60 'coupl':34,39 'deliv':25 'electr':14 'electron':54 'equip':43 'fabric':65 'frequenc':3 'generat':10,42 'icp':36 'induct':33 'manufactur':13 'modul':58 'monitor':57 'plasma':9,27,35,40,61 'power':5,15,24,30,47 'process':53,62 'radio':2 'radio-frequ':1 'regul':20 'rf':4,8,23,29,46 'semiconductor':12,52,64 'sourc':28 'suppli':6,45 'system':31 'wafer':49

DIRECT RF

Owner

Goods & Services