semiconductor wafer processing equipment and components, namely, [ epitaxial reactors, ] chemical vapor deposition reactors, [ physical vapor deposition reactors, ] plasma etchers, [ ion implanter, supporting frames therefor, chemical mechanical polishers, ] and parts thereof; and computer [ operating ] programs for use therewith

'chemic':10,25 'compon':6 'comput':32 'deposit':12,16 'epitaxi':8 'equip':4 'etcher':19 'frame':23 'implant':21 'ion':20 'mechan':26 'name':7 'oper':33 'part':29 'physic':14 'plasma':18 'polish':27 'process':3 'program':34 'reactor':9,13,17 'semiconductor':1 'support':22 'therefor':24 'thereof':30 'therewith':37 'use':36 'vapor':11,15 'wafer':2

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