semiconductor wafer processing equipment and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanter, supporting frames therefor, chemical mechanical polishers, and parts thereof, and computer programs for use therewith

'chemic':10,25 'compon':6 'comput':32 'deposit':12,16 'epitaxi':8 'equip':4 'etcher':19 'frame':23 'implant':21 'ion':20 'mechan':26 'name':7 'part':29 'physic':14 'plasma':18 'polish':27 'process':3 'program':33 'reactor':9,13,17 'semiconductor':1 'support':22 'therefor':24 'thereof':30 'therewith':36 'use':35 'vapor':11,15 'wafer':2

repair and maintenance of semiconductor wafer processing equipment and parts therefor

'equip':8 'mainten':3 'part':10 'process':7 'repair':1 'semiconductor':5 'therefor':11 'wafer':6

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