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CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, COMPRISING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, USED FOR THE REMOVAL OF ORGANIC CONTAMINATION, SUCH AS PHOTORESIST, PHOTORESIDUES AND DRY ETCHING RESIDUES ON SEMICONDUCTOR SUBSTRATES

CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, COMPRISING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, USED FOR THE FORMATION OF AN OXIDE LAYER ON SEMICONDUCTOR SUBSTRATES

TECHNICAL AND SCIENTIFIC RESEARCH AND DEVELOPMENT IN THE FIELD OF CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, CONTAINING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, AND IN THE FIELD OF MICRO-ELECTRONICS, FOR COMPOSING METHODS OR DESIGNING EQUIPMENT FOR THE REMOVAL OF ORGANIC CONTAMINATION OR FOR THE FORMATION OF OXIDE LAYERS ON SEMICONDUCTOR WAFERS, SEMICONDUCTOR SUBSTRATES AND FLAT PANEL DISPLAYS

CHEMICAL APPARATUS FOR THE TREATMENT OF SEMICONDUCTOR WAFERS, SEMICONDUCTOR SUBSTRATES AND FLAT PANEL DISPLAYS