Semiconductor wafer processing [equipment]; namely, [ epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors,] plasma etchers[, ion implanters, electronic measuring and monitoring apparatus, and wafer polishing apparatus; all ] for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

'apparatus':24,28 'chemic':8 'deposit':10,14 'disc':41 'electron':20 'epitaxi':6 'equip':4 'etcher':17 'film':39 'implant':19 'ion':18 'measur':21 'monitor':23 'name':5 'physic':12 'plasma':16 'polish':27 'process':3,32 'product':34 'reactor':7,11,15 'semiconductor':1,36 'silicon':40 'substrat':37 'thin':38 'vapor':9,13 'wafer':2,26,43

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