U.S. federal trademark · Serial No. 99382086
Chemicals for use in lithography; Chemical preparations for use in processing photosensitive material; Photographic developers for positive type photoresist; Liquid photoimagable compositions being photographic chemicals; Photosensitive materials, namely, photosensitive industrial chemicals for industrial preparations; Lithographic chemicals; Chemical compositions and materials for use in science; Chemicals for use in the semiconductor industry; Chemical preparations for use in industry; Chemical preparations for scientific purposes, other than for medical or veterinary use; Chemicals used in the manufacture of semiconductor chips; Chemical source material for the deposition of thin films upon semiconductor wafers for the manufacture of semiconductors; Chemical reagents for use in industry, other than for medical or veterinary purposes; Chemical compounds for use in the manufacture of polymers; Fluorspar compounds used to make chemicals for semiconductor manufacturing; Unprocessed fluorinated polymers; chemicals used in industry, namely, photoinitiators for the polymerization of artificial resins; Photocatalyst solutions; Resists of light sensitive resins; Industrial organic chemicals; Catalysts for use in the manufacture of polymers; Organic acids for industrial use; Polymerisation catalysts for chemical processes; Chemical preparations, namely, salts for industrial preparations; Perfluorinated chemical compounds prepared synthetically for use in manufacture; Compositions for use in the manufacture of radiation chemicals; Salts for industrial purposes; Curing agent for synthetic resin; Chemical substances for analyses in laboratories, other than for medical or veterinary purposes; chemical preparations for scientific purposes
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.