Equipment and machines for the processing and production of semiconductor substrates, thin films, silicon discs and wafers, namely, machines in the nature of process chambers for deposition, etching, implantation, thermal processing, epitaxial growth, and substrate transferring, and machines for polishing, cleaning, process monitoring, and measuring during the production of semiconductor substrates

'chamber':25 'clean':41 'deposit':27 'disc':15 'epitaxi':32 'equip':1 'etch':28 'film':13 'growth':33 'implant':29 'machin':3,19,38 'measur':45 'monitor':43 'name':18 'natur':22 'polish':40 'process':6,24,31,42 'product':8,48 'semiconductor':10,50 'silicon':14 'substrat':11,35,51 'thermal':30 'thin':12 'transfer':36 'wafer':17

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