U.S. federal trademark · Serial No. 75889779 · Reg. No. 435575
Low pressure chemical vapor deposition device; diffusion furnace; plasma enhanced chemical vapor deposition device; metal organic chemical vapor deposition devices- rapid thermal chemical vapor deposition device; high temperature chemical vapor deposition device; vapor phase epitaxy device; liquid phase epitaxy device; atmospheric pressure chemical vapor deposition device; semi-atmospheric chemical vapor deposition device,
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