Power supplies; Power supplies for plasma generator; Power supplies for plasma generator for plasma etching and deposition; Power supplies for use in semiconductor processing; Radio frequency power supplies for plasma generator; Radio frequency (RF) generators for supplying radio-frequency energy; Radio frequency (RF) generators for use in plasma etching and deposition; Radio frequency (RF) generators for use in semiconductor processing; Electrical power control for apparatus for conducting, regulating, and controlling RF power delivered to plasma sources; Power supply for inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) generators; Equipment for supplying RF power for semiconductor processing

'apparatus':66 'capacit':86 'ccp':89 'conduct':68 'control':64,71 'coupl':82,87 'deliv':74 'deposit':17,52 'electr':62 'energi':41 'equip':91 'etch':15,50 'frequenc':26,33,40,43,54 'generat':7,12,31,35,45,56,90 'icp':84 'induct':81 'plasma':6,11,14,30,49,76,83,88 'power':1,3,8,18,27,63,73,78,95 'process':24,61,98 'radio':25,32,39,42,53 'radio-frequ':38 'regul':69 'rf':34,44,55,72,94 'semiconductor':23,60,97 'sourc':77 'suppli':2,4,9,19,28,37,79,93 'use':21,47,58

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