Trademark Search  /  FORMION

FORMION

● Live · Pending

U.S. federal trademark · Serial No. 98182019

Mark
FORMION
Status
Pending
Serial Number
98182019
Filing Date
September 15, 2023
Class(es)
Class 007, Class 009

Owners

ASM IP Holding B.V.
99 · Almere, NL
ASM IP Holding B.V.
99 · Almere, NL

Goods & Services

Electrical reactors for processing semiconductor wafers; electronic controllers for electrical reactors and industrial robots for use by the semiconductor industry; electronic control systems for semiconductor manufacturing machines; laboratory chemical reactors; robots being electronic control devices, namely, laboratory robots; electronic control systems for machines; structural parts for laboratory chemical reactors, electrical reactors for processing semiconductor wafers and laboratory robots

Machines for the assembly and packaging of electronic semiconductor chips; machines for manufacturing semiconductors, and structural parts therefor; semiconductor manufacturing machines; semiconductor manufacturing machines and systems composed of a vacuum chamber for accommodating semiconductor wafers and structural parts therefor and machines for handling and transferring semiconductor wafers into and out of the vacuum chamber, and structural parts therefor; machines for the treatment of semiconductor wafers, namely, semi-conductor wafer processing machines; industrial robots for the handling of semiconductor wafers; machines for the assembly and packaging of electronic chips; industrial chemical reactors; industrial robots; Industrial surface treatment equipment, namely, vacuum plasma treatment systems comprised of a high frequency, high voltage generator, controls, and treatment chamber, and structural parts therefor; reactors for processing semiconductor wafers, namely, industrial chemical reactors for the thermal treatment of semiconductor wafers; industrial chemical reactors, namely, semiconductor wafer processing reactors for the chemical treatment and the thermal treatment of semiconductor wafers and for the chemical cleaning of semiconductor wafers by means of a gas phase process, also with the use of plasma, namely, gas discharge

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Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.