Equipment and machines for the spectrophotometric monitoring and measuring of the processing and production of semiconductor substrates, thin films, silicon discs and wafers, namely, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters and chemical mechanical polishers

'chemic':25,38 'deposit':27,31 'disc':21 'equip':1 'etcher':34 'film':19 'implant':36 'ion':35 'machin':3 'measur':9 'mechan':39 'monitor':7 'name':24 'physic':29 'plasma':33 'polish':40 'process':12 'product':14 'reactor':28,32 'semiconductor':16 'silicon':20 'spectrophotometr':6 'substrat':17 'thin':18 'vapor':26,30 'wafer':23

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