apparatus and instruments for electron beam lithography; electric, electronic, optical, optoelectronic and beam radiation apparatus and instruments, all for writing masks, reticles and patterns used in the manufacture of semiconductor components; irradiation apparatus and instruments; parts and fittings for all the aforesaid goods

'aforesaid':42 'apparatus':1,15,33 'beam':6,13 'compon':31 'electr':8 'electron':5,9 'fit':38 'good':43 'instrument':3,17,35 'irradi':32 'lithographi':7 'manufactur':28 'mask':21 'optic':10 'optoelectron':11 'part':36 'pattern':24 'radiat':14 'reticl':22 'semiconductor':30 'use':25 'write':20

GIGAMASK

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