Barrier vacuum deposition system comprised of a single vacuum chamber or sequential vacuum chambers designed to deposit multi-layer thin film coatings composed of polymer layers and ceramic layers, one or more chambers including a UV or electron beam curing station for the curing of monomer into polymer, a load lock or load lock(s) to allow for transfer of the material to be coated to the multi-layer thin film barrier coating deposition equipment, and computerized process control equipment to monitor and control the multi-layer thin film and associated processes

'allow':58 'associ':94 'barrier':1,74 'beam':40 'ceram':29 'chamber':10,14,34 'coat':23,66,75 'compos':24 'compris':5 'computer':79 'control':81,86 'cure':41,45 'deposit':3,17,76 'design':15 'electron':39 'equip':77,82 'film':22,73,92 'includ':35 'layer':20,27,30,71,90 'load':51,54 'lock':52,55 'materi':63 'monitor':84 'monom':47 'multi':19,70,89 'multi-lay':18,69,88 'one':31 'polym':26,49 'process':80,95 'sequenti':12 'singl':8 'station':42 'system':4 'thin':21,72,91 'transfer':60 'uv':37 'vacuum':2,9,13

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