U.S. federal trademark · Serial No. 76249601
Plasma generating equipment and machines for the processing and production of semiconductor substrates, thin films, silicon discs and wafers; namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.