high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy and mask repair; focused electron beam columns for electron beam lithography, electron beam microscopy, and liquid metal ion sources

'beam':7,16,22,33,37,40 'bright':2 'column':8,17,34 'electron':6,32,36,39 'emiss':11 'field':10 'focus':14,31 'high':1 'ion':4,15,19,21,25,45 'liquid':43 'lithographi':20,38 'mask':29 'mass':26 'metal':44 'microscopi':41 'mill':23 'name':13 'repair':30 'secondari':24 'sourc':46 'spectroscopi':27 'submicron':3 'technolog':12 'use':9

HELIOS HYDRA

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