Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and an in-situ imaging objective with mounting means attached to a framework in the same form factor as a standard reticle for use in exposing photographically prepared patterns and images that are used for measuring and aiming to the sufraces of wafers for use in manufacturing of integrated circuits

'aim':66 'analyz':20 'apparatus':12 'attach':38 'captur':26 'circuit':78 'compon':1 'compris':13 'comput':15 'data':21 'expos':54 'factor':46 'form':45 'framework':41 'imag':25,33,59 'in-situ':30 'industri':10 'instrument':4 'integr':77 'manufactur':75 'mean':37 'measur':64 'mount':36 'name':11 'object':34 'optic':3 'pattern':57 'photograph':55 'prepar':56 'receiv':22 'reticl':50 'semiconductor':9 'situ':32 'softwar':16 'standard':49 'sufrac':69 'tool':27 'use':6,18,52,62,73 'wafer':71

HIGH ACCURACY SOURCE METROLOGY INSTRUMENT (HA-SMI).

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