Process equipment for the chemical treatment of semiconductor wafers by means of a gas phase process; chemical reactors for the thermal treatment of semiconductor wafers by means of a gas phase process, reactors for the chemical cleaning of semiconductor wafers by means of a gas phase process, also with the use of electrical gas discharge

'also':48 'chemic':5,17,36 'clean':37 'discharg':55 'electr':53 'equip':2 'gas':14,30,45,54 'mean':11,27,42 'phase':15,31,46 'process':1,16,32,47 'reactor':18,33 'semiconductor':8,24,39 'thermal':21 'treatment':6,22 'use':51 'wafer':9,25,40

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