U.S. federal trademark · Serial No. 97887688 · Reg. No. 7672708
Photoresists in the nature of chemicals; solutions of chemicals useful to form metal oxide thin films; solutions of chemicals for deposition of metal oxide thin films for use as hard mask layers; metal oxides for use in a photoresist process, namely, solutions of metal oxides; developers, namely, photoresist developers for use with photoresists in the nature of chemicals; underlayer materials in the nature of chemicals, namely, chemical compositions for use with photoresist patterning
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