Semiconductor wafer processing equipment and machines, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, chemical mechanical polishers, and process monitoring equipment; all for the processing and production of semiconductor substrates, thin films, silicon chips and silicon wafers

'chemic':10,22 'chip':41 'deposit':12,16 'epitaxi':8 'equip':4,28 'etcher':19 'film':39 'implant':21 'ion':20 'machin':6 'mechan':23 'monitor':27 'name':7 'physic':14 'plasma':18 'polish':24 'process':3,26,32 'product':34 'reactor':9,13,17 'semiconductor':1,36 'silicon':40,43 'substrat':37 'thin':38 'vapor':11,15 'wafer':2,44

IECP

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