Equipment and machines, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, and ion implanters for the processing and production of semiconductor substrates, thin films, silicon chips and wafers including polishing, cleaning and process monitoring equipment

'chemic':7 'chip':31 'clean':36 'deposit':9,13 'epitaxi':5 'equip':1,40 'etcher':16 'film':29 'implant':19 'includ':34 'ion':18 'machin':3 'monitor':39 'name':4 'physic':11 'plasma':15 'polish':35 'process':22,38 'product':24 'reactor':6,10,14 'semiconductor':26 'silicon':30 'substrat':27 'thin':28 'vapor':8,12 'wafer':33

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