optical metrology product that provides an accurate measurement of the Numerical Aperture of a lithography tool and variation of same across the stepper or scanner exposure field, by utilizing an instrument that fits in a standard reticle/pellicle envelope, and a software package that processes the wafer images

'accur':7 'across':21 'apertur':12 'envelop':38 'exposur':26 'field':27 'fit':33 'imag':47 'instrument':31 'lithographi':15 'measur':8 'metrolog':2 'numer':11 'optic':1 'packag':42 'process':44 'product':3 'provid':5 'reticle/pellicle':37 'scanner':25 'softwar':41 'standard':36 'stepper':23 'tool':16 'util':29 'variat':18 'wafer':46

LUMENA

Owner

Goods & Services