Integrated vacuum equipment for use in research and development comprised of physical vapor deposition (PVD) machines and chemical vapor deposition (CVD) machines; vacuum machine parts and components, namely, mechanical roughing pumps, high vacuum pumps, vacuum chambers, vacuum flanges, vacuum isolation valves, linear motion manipulators, substrate stages for isolating the deposition source from the substrate, vacuum seals, vacuum connectors, vacuum feedthroughs, vacuum parts and thin film deposition sources

'chamber':36 'chemic':18 'compon':27 'compris':10 'connector':58 'cvd':21 'deposit':14,20,50,66 'develop':9 'equip':3 'feedthrough':60 'film':65 'flang':38 'high':32 'integr':1 'isol':40,48 'linear':42 'machin':16,22,24 'manipul':44 'mechan':29 'motion':43 'name':28 'part':25,62 'physic':12 'pump':31,34 'pvd':15 'research':7 'rough':30 'seal':56 'sourc':51,67 'stage':46 'substrat':45,54 'thin':64 'use':5 'vacuum':2,23,33,35,37,39,55,57,59,61 'valv':41 'vapor':13,19

MARK IV

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