U.S. federal trademark · Serial No. 86868787
atomic layer deposition systems comprised of a reaction chamber, precursor lines and a cabinet, all sold as a unit for performing atomic deposition layering for use in applying atomic layer coatings on various surfaces or for use as combined with a semiconductor wafer processing machine as a dual purpose unit
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.