Machinery and parts thereof for coating articles by means of physical vapour deposition, chemical vapour deposition including atomic layer deposition or a combination of physical vapour deposition and chemical vapour deposition; arc coating machines and parts therefor; vacuum generation pumps; sputtering machines and parts therefor, magnetron sputtering machines and parts therefor, namely, sputtering sources, magnetron sputtering sources, targets of metal and/or ceramics, being cathodes, for magnetron sputtering sources; machine parts, namely, arc sources and targets of metal and/or ceramics, being cathodes, for arc sources; vacuum treatment chambers for carrying out physical vapour deposition and chemical vapour deposition

'and/or':61,78 'arc':32,72,83 'articl':7 'atom':18 'carri':89 'cathod':64,81 'ceram':62,79 'chamber':87 'chemic':14,29,95 'coat':6,33 'combin':23 'deposit':13,16,20,27,31,93,97 'generat':39 'includ':17 'layer':19 'machin':34,42,48,69 'machineri':1 'magnetron':46,55,66 'mean':9 'metal':60,77 'name':52,71 'part':3,36,44,50,70 'physic':11,25,91 'pump':40 'sourc':54,57,68,73,84 'sputter':41,47,53,56,67 'target':58,75 'therefor':37,45,51 'thereof':4 'treatment':86 'vacuum':38,85 'vapour':12,15,26,30,92,96

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