A metrology tool for measuring the thickness, and analyzing the composition of certain films such as, but not limited to, polycrystalline films deposited on substrates including, but not limited to, semiconductor wafers, flat panel display substrates and magnetic head substrates, such film properties are determined by various methods such as, but not limited to, reflectometry, ellipsometry and interferometry

'analyz':9 'certain':13 'composit':11 'deposit':23 'determin':45 'display':35 'ellipsometri':56 'film':14,22,42 'flat':33 'head':39 'includ':26 'interferometri':58 'limit':19,29,53 'magnet':38 'measur':5 'method':48 'metrolog':2 'panel':34 'polycrystallin':21 'properti':43 'reflectometri':55 'semiconductor':31 'substrat':25,36,40 'thick':7 'tool':3 'various':47 'wafer':32

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