U.S. federal trademark · Serial No. 98146173 · Reg. No. 8188290
Chemicals for any of storage, dispensing, abatement, and purification of gases; Chemical source material for the deposition of thin films for the manufacture of semiconductors; Chemicals for industrial purposes; Chemical adsorbents for separating constituents in fluids; Chemical adsorbents for separating impurities or other constituents in industrial flow streams; Chemical adsorbents applied to a substrate for separating constituents in fluids; Chemical adsorbents applied to a substrate for separating impurities or other constituents in industrial flow streams; Chemical adsorbents for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; Chemical adsorbents to be applied to substrates for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases; Chemical adsorbents to be applied to substrates for separation of organic or inorganic impurities in fluids; Chemical adsorbents to be applied to substrates to be used as filters for removing or deactivating any one or more of impurities, pollutants, biological agents and toxic chemicals from air or other gases
Research and development in the fields of metal organic frameworks (MOFs), molecularly engineered materials, and molecular manufacturing; Product research and development; Product research and development services in the fields of metal organic frameworks (MOFs), molecularly engineered materials, and molecular manufacturing for use in the electronics, industrial, and defense sectors; Research and development of technology in the field of metal organic frameworks (MOFs), molecularly engineered materials, and molecular manufacturing
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.