CLEANING OF HIGH-TECHNOLOGY MANUFACTURING AND DEVICE SURFACES, NAMELY SEMICONDUCTOR MANUFACTURING SURFACES, MICROELECTROMECHANICAL SYSTEM (MEMS) MANUFACTURING SURFACES, SENSOR HEADS, SPACE INSTRUMENTATION SURFACES, SATELLITE INSTRUMENTATION SURFACES, SOLAR CELLS, AND ELECTRICAL CONTACT SURFACES

'cell':28 'clean':1 'contact':31 'devic':8 'electr':30 'head':20 'high':4 'high-technolog':3 'instrument':22,25 'manufactur':6,12,17 'mem':16 'microelectromechan':14 'name':10 'satellit':24 'semiconductor':11 'sensor':19 'solar':27 'space':21 'surfac':9,13,18,23,26,32 'system':15 'technolog':5

MACHINES FOR CLEANING HIGH-TECHNOLOGY MANUFACTURING AND DEVICE SURFACES, NAMELY, SEMICONDUCTOR MANUFACTURING SURFACES, MICROELECTROMECHANICAL SYSTEM (MEMS) MANUFACTURING SURFACES, SENSOR HEADS, SPACE INSTRUMENTATION SURFACES, SATELLITE INSTRUMENTATION SURFACES, SOLAR CELLS, AND ELECTRICAL CONTACT SURFACES, USING HIGH-VELOCITY LIQUID PARTICLE CLUSTERS

'cell':29 'clean':3 'cluster':40 'contact':32 'devic':9 'electr':31 'head':21 'high':5,36 'high-technolog':4 'high-veloc':35 'instrument':23,26 'liquid':38 'machin':1 'manufactur':7,13,18 'mem':17 'microelectromechan':15 'name':11 'particl':39 'satellit':25 'semiconductor':12 'sensor':20 'solar':28 'space':22 'surfac':10,14,19,24,27,33 'system':16 'technolog':6 'use':34 'veloc':37

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