Semiconductor wafer processing equipment and components, namely-- epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, measuring and monitoring tools, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

'chemic':10,27 'compon':6 'deposit':12,16 'disc':42 'epitaxi':8 'equip':4 'etcher':19 'film':40 'implant':21 'ion':20 'measur':22 'mechan':28 'monitor':24 'name':7 'physic':14 'plasma':18 'polish':29 'process':3,33 'product':35 'reactor':9,13,17 'semiconductor':1,37 'silicon':41 'substrat':38 'thin':39 'tool':25 'vapor':11,15 'wafer':2,44

Brochures and newsletters published periodically regarding equipment and machines for the processing and production of semiconductor substrates, thin films, silicon discs and wafers; semiconductor processing and production equipment manuals; and technical reports, namely printed reports in the field of processing and production of semiconductor substrates, thin films, silicon discs and wafers

'brochur':1 'disc':21,49 'equip':7,28 'field':38 'film':19,47 'machin':9 'manual':29 'name':33 'newslett':3 'period':5 'print':34 'process':12,25,40 'product':14,27,42 'publish':4 'regard':6 'report':32,35 'semiconductor':16,24,44 'silicon':20,48 'substrat':17,45 'technic':31 'thin':18,46 'wafer':23,51

NANOMANUFACTURING TECHNOLOGY

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