Metrology system for the detection and measurement of particles and defects comprised principally of low distortion optics, a high intensity broadband light source, high resolution detector, and image processing and defect detection software, that enables inspection of both the front and backside of a sample, particularly, a semiconductor wafer, mask, flat panel display, or magnetic substrate

'backsid':42 'broadband':21 'compris':12 'defect':11,31 'detect':5,32 'detector':26 'display':53 'distort':16 'enabl':35 'flat':51 'front':40 'high':19,24 'imag':28 'inspect':36 'intens':20 'light':22 'low':15 'magnet':55 'mask':50 'measur':7 'metrolog':1 'optic':17 'panel':52 'particl':9 'particular':46 'princip':13 'process':29 'resolut':25 'sampl':45 'semiconductor':48 'softwar':33 'sourc':23 'substrat':56 'system':2 'wafer':49

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