U.S. federal trademark · Serial No. 74646770 · Reg. No. 2352131
electron beam lithography system, namely, electron gun, electron optical column, electron beam lenses, electron beam deflector, sample chamber, substrate stage, wafer transporter and loader, vacuum pump and controller, control and data storage computer, operating software, operator console, and power supply, and parts therefor
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.