SEMI-CONDUCTOR MANUFACTURING APPARATUS, NAMELY, ELECTRON BEAM EXPOSURE MACHINES, EPITAXIAL REACTORS, CHEMICAL VAPOR DEPOSITION MACHINES, PHYSICAL VAPOR DEPOSITION MACHINES, PLASMA ETCHERS, ION IMPLANTERS, AND CHEMICAL MECHANICAL POLISHERS, CHEMICAL VAPOR DEPOSITION PROCESSING CHAMBERS, MASK INSPECTION MACHINES, ULTRA HIGH VACUUM PUMPS AND WAFER-HANDLING CLUSTER TOOLS

'apparatus':5 'beam':8 'chamber':33 'chemic':13,26,29 'cluster':45 'conductor':3 'deposit':15,19,31 'electron':7 'epitaxi':11 'etcher':22 'exposur':9 'handl':44 'high':38 'implant':24 'inspect':35 'ion':23 'machin':10,16,20,36 'manufactur':4 'mask':34 'mechan':27 'name':6 'physic':17 'plasma':21 'polish':28 'process':32 'pump':40 'reactor':12 'semi':2 'semi-conductor':1 'tool':46 'ultra':37 'vacuum':39 'vapor':14,18,30 'wafer':43 'wafer-handl':42

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