U.S. federal trademark · Serial No. 99541070
Radio-frequency (RF) power supplies and RF plasma generators for semiconductor manufacturing; electrical power control apparatus for conducting, regulating, and controlling RF power delivered to plasma sources; RF power systems comprised of RF power amplifiers and RF generators for inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) generation; power supplies, namely, equipment for supplying RF for wafer biasing in semiconductor processing; electronic apparatus for monitoring, modulating, and controlling plasma processes in semiconductor fabrication chambers
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.