atom and radical source instruments, namely RF gas cracker instruments, RF solids cracker instruments and RF / Thermal valved Crackers; mini e-beam evaporator instruments, ionised-beam K-cells, time-of-flight medium energy ion scattering spectroscope instruments, UHV substrate holder instruments, nanocluster source instruments, electron guns, ion cleaning source instruments, ion source instruments for high rate ion deposition, UHV magnetrons for high rate ion deposition, piezoelectric leak valves, ion-assisted physical vapour deposition instruments, supersonic pencil-beam plasma source instruments, high density gas atom source instruments

'assist':75 'atom':1,90 'beam':23,28,83 'cell':31 'clean':52 'cracker':9,13,19 'densiti':88 'deposit':62,69,78 'e':22 'e-beam':21 'electron':49 'energi':37 'evapor':24 'flight':35 'gas':8,89 'gun':50 'high':59,66,87 'holder':44 'instrument':5,10,14,25,41,45,48,54,57,79,86,92 'ion':38,51,55,61,68,74 'ion-assist':73 'ionis':27 'ionised-beam':26 'k':30 'k-cell':29 'leak':71 'magnetron':64 'medium':36 'mini':20 'name':6 'nanoclust':46 'pencil':82 'pencil-beam':81 'physic':76 'piezoelectr':70 'plasma':84 'radic':3 'rate':60,67 'rf':7,11,16 'scatter':39 'solid':12 'sourc':4,47,53,56,85,91 'spectroscop':40 'substrat':43 'superson':80 'thermal':17 'time':33 'time-of-flight':32 'uhv':42,63 'valv':18,72 'vapour':77

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