Metrology apparatus for semiconductor manufacturing, namely, in-situ units for measuring thin film stress on semiconductor wafers during transport into and out of process chambers of physical vapor deposition (PVD) and chemical vapor deposition (CVD) tools; downloadable and recorded computer software for controlling, operating, and analyzing measurements from such metrology apparatus.

'analyz':47 'apparatus':2,52 'chamber':26 'chemic':33 'comput':41 'control':44 'cvd':36 'deposit':30,35 'download':38 'film':14 'in-situ':7 'manufactur':5 'measur':12,48 'metrolog':1,51 'name':6 'oper':45 'physic':28 'process':25 'pvd':31 'record':40 'semiconductor':4,17 'situ':9 'softwar':42 'stress':15 'thin':13 'tool':37 'transport':20 'unit':10 'vapor':29,34 'wafer':18

PASCALO

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