Systems consisting of halogen lamps and arc lamps for the thermal treatment of substrates, semiconductor substrates, silicon discs and wafers for the production of semiconductor chips, rapid steam heating apparatuses and rapid thermal processing machines and epitaxial-reactors for the treatment and production of semiconductors

'apparatus':30 'arc':7 'chip':26 'consist':2 'disc':18 'epitaxi':38 'epitaxial-reactor':37 'halogen':4 'heat':29 'lamp':5,8 'machin':35 'process':34 'product':23,44 'rapid':27,32 'reactor':39 'semiconductor':15,25,46 'silicon':17 'steam':28 'substrat':14,16 'system':1 'thermal':11,33 'treatment':12,42 'wafer':20

Machines, namely, semiconductor manufacturing machines for the treatment of substrates, semiconductor substrates, silicon discs and wafers for semiconductor chip manufacturing and for making semiconductor film or layer structures, namely, rapid thermal processing machines and expitaxial-reactors

'chip':19 'disc':14 'expitaxi':36 'expitaxial-reactor':35 'film':25 'layer':27 'machin':1,5,33 'make':23 'manufactur':4,20 'name':2,29 'process':32 'rapid':30 'reactor':37 'semiconductor':3,11,18,24 'silicon':13 'structur':28 'substrat':10,12 'thermal':31 'treatment':8 'wafer':16

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