U.S. federal trademark · Serial No. 79106107 · Reg. No. 4296791
Data processing equipment; computers and computer programmes for controlling and monitoring atomic scale layer deposition apparatus, namely, reactors and reactor systems consisting of several reactors, for collecting data from aforementioned atomic scale layer deposition apparatus, user interface software for aforementioned atomic scale layer deposition apparatus, computer software enabling aforementioned atomic scale layer deposition apparatus to interface and communicate with devices used in connection with aforementioned atomic scale layer deposition apparatus, computer software for controlling and monitoring devices used in connection with aforementioned atomic scale layer deposition apparatus
Machines and machine tools for atomic scale layer deposition; atomic scale layer deposition apparatus, namely, industrial chemical [ and industrial photochemical ] reactors; reactor systems consisting of several industrial chemical [ and industrial photochemical ] reactors, precursor sources, inactive gas sources, plasma sources, source units, loading units, lift units, substrate holders, deposition cartridges, diffusion enhancers, gas treatment units, particle traps, water cooling units and chillers, all of which are sold as an integral part of the atomic scale layer deposition industrial chemical [ and industrial photochemical ] reactors; and reactor systems consisting of several industrial chemical [ and industrial photochemical ] reactors as described above
Treatment and coating of materials by atomic scale layer deposition method and consulting connected thereto
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.