Trademark Search  /  POLARIS

POLARIS

○ Dead · Cancelled

U.S. federal trademark · Serial No. 79163066 · Reg. No. 4938887

Mark
POLARIS
Status
Cancelled
Serial Number
79163066
Registration No.
4938887
Filing Date
October 29, 2014
Registration Date
April 19, 2016
Class(es)
Class 009

Owners

Oxford Instruments Nanotechnology Tools Limited
99 · Abingdon, Oxon, GB
Oxford Instruments Nanotechnology Tools Limited
99 · GB
Oxford Instruments Nanotechnology Tools Limited
99 · GB

Goods & Services

Scientific and laboratory apparatus and instruments in the field of plasma technology and semiconductor processing, namely, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling all being laboratory apparatus and instruments; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, all being laboratory apparatus and instruments; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods

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Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.