Equipment and machines for the processing and production of semiconductor substrates, thin films, silicon discs and wafers, namely, thermal processing/anneal reactors, epitaxial reactors, chemical vapor deposition reactors, plasma etchers, ion implanters and chemical mechanical polishers

'chemic':24,33 'deposit':26 'disc':15 'epitaxi':22 'equip':1 'etcher':29 'film':13 'implant':31 'ion':30 'machin':3 'mechan':34 'name':18 'plasma':28 'polish':35 'process':6 'processing/anneal':20 'product':8 'reactor':21,23,27 'semiconductor':10 'silicon':14 'substrat':11 'thermal':19 'thin':12 'vapor':25 'wafer':17

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