Semiconductor manufacturing apparatus, namely, physical vapor deposition (PVD) systems and magnetron modules for use in sputter deposition chambers, for controlling thin-film deposition and improving film uniformity and material utilization

'apparatus':3 'chamber':18 'control':20 'deposit':7,17,24 'film':23,27 'improv':26 'magnetron':11 'manufactur':2 'materi':30 'modul':12 'name':4 'physic':5 'pvd':8 'semiconductor':1 'sputter':16 'system':9 'thin':22 'thin-film':21 'uniform':28 'use':14 'util':31 'vapor':6

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